Laser Beam Sampler

In a beam sampler the percentage of reflected light is determined by the fresnel reflection from a single surface.

Laser beam sampler.

The prism front surface beam sampler pfsa is a c mount fixture housing a uv grade fused silica right angle prism used for sampling the front surface reflection for high power energy beam profiling applications. A laser beam profiler captures displays and records the spatial intensity profile of a laser beam at a particular plane transverse to the beam propagation path. These two sample beams are located to the left and right of the main beam 1 and 1 orders and are characterized by a given separation angle between them and by a sample power ratio. Since there are many types of lasers ultraviolet visible infrared continuous wave pulsed high power low power there is an assortment of instrumentation for measuring laser beam profiles.

The damage threshold for our uvfs beam samplers is 5j cm 2 for an 810nm laser 10ns 10hz with spot size of 0 158mm. The transmitted beam deviation of a wedged beamsplitter is larger then with a beamsplitter made of an optical parallel. Beam samplers with anti reflection laser line coatings for 266nm 355nm 532nm and 1064nm wavelengths are available. A flat top laser beam shaper is a diffractive optical element doe that transforms the gaussian beam into a flat top beam with uniform intensity inside a well defined shape with pre designed angular dimensions and a.

The lbp2 sam series beam sampler is designed so that the preferential polarization selection effect of a single wedge is cancelled out and the resulting beam image is polarization corrected to restore the polarization components of the original beam. A top hat beam shape r also known as flat top beam shaper is the high end option applicable for laser systems that use single mode low m 2 laser beams typically m 2 1 5. Techspec nd yag laser line beam samplers can be used with laser measurement products to monitor beam properties such as beam power and beam profile in real time. Reflection at nominal incidence of 45 is polarization and wavelength dependent with 532nm s polarization reflected at 8 27 and p polarization at 0 68.

By reflecting approximately 10 of s polarization and 1 of p polarization at the nominal 45 aoi the beam sampler picks off 1 10 of an incident beam depending on its polarization upon incidence. The beam sampler has a reflectance of 5 2 when the material is bk7 and the input beam is unpolarized or circularly polarized. A sinusoidal diffracting relief is etched on this outer surface directly into the light propagating material of the substrate. The substrate defines an outer surface through which the light beam being sampled propagates.